Estudio comparativo del recubrimiento de carburo de silicio (SiC) depositado mediante reactor PECVD sobre sustratos de MgAZ31 y AISI316
Date
2023-10-01
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Abstract
En este artículo, se presenta un estudio comparativo del recubrimiento SiC depositado en un reactor
PECVD sobre sustratos de MgAZ31 y AISI 316. El objetivo de este trabajo es analizar la influencia del
sustrato en las propiedades del recubrimiento y demostrar que la técnica PECVD ofrece la posibilidad
de realizar recubrimientos de SiC, lo cual amplía las posibilidades en el desarrollo de nuevos productos y
aplicaciones. El estudio demostrará que la técnica PECVD ofrece la posibilidad de realizar recubrimientos
de SiC que podrían no ser viables con otras técnicas de deposición. Esto amplía las oportunidades en el
desarrollo de nuevos productos y aplicaciones que requieran las propiedades características del SiC. Al
comparar los dos sustratos, se evaluarán parámetros como la adherencia del recubrimiento, la estructura
cristalina, las propiedades mecánicas y la resistencia a la corrosión.
This article presents a comparative study of SiC coating deposited in a PECVD reactor on MgAZ31 and AISI 316 substrates. The main objective is to analyze the influence of the substrate on the properties of the coating. Furthermore, it will be demonstrated that the PECVD technique offers the possibility of producing SiC coatings that would not be viable with other deposition techniques, thus expanding the possibilities in the development of new products and applications. The study will show that the PECVD technique offers the potential to achieve SiC coatings that may not be feasible with other deposition techniques. This broa- dens opportunities for the development of new products and applications that require the unique properties of SiC. When comparing the two substrates, parameters such as coating adhesion, crystal structure, mecha- nical properties, and corrosion resistance will be evaluated
This article presents a comparative study of SiC coating deposited in a PECVD reactor on MgAZ31 and AISI 316 substrates. The main objective is to analyze the influence of the substrate on the properties of the coating. Furthermore, it will be demonstrated that the PECVD technique offers the possibility of producing SiC coatings that would not be viable with other deposition techniques, thus expanding the possibilities in the development of new products and applications. The study will show that the PECVD technique offers the potential to achieve SiC coatings that may not be feasible with other deposition techniques. This broa- dens opportunities for the development of new products and applications that require the unique properties of SiC. When comparing the two substrates, parameters such as coating adhesion, crystal structure, mecha- nical properties, and corrosion resistance will be evaluated
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Keywords
carburo de silicio, recubrimiento, plasma, sillicom carbide, coating, plasma
Citation
Proyecciones Vol. 21 (2)
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